The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 1988
Filed:
Jan. 06, 1987
Herbert L Hettich, Santa Barbara, CA (US);
Samuel F Pellicori, Santa Barbara, CA (US);
Santa Barbara Research Center, Goleta, CA (US);
Abstract
An article of manufacture includes a substrate carrying at least two coating layers, one layer being of approximately quarter wave optical thickness, the other layer of approximately two quarter wave optical thickness, with the layers alternating between a material such as a dielectric having a first index of refraction and a second material such as a dielectric having a second index of refraction lower than the first index of refraction. These layers form a filtering system which removes narrow bands of light such as laser wavelengths by efficient reflection while permitting the remainder of the light spectrum to pass through the article. The coating layers have optical thicknesses and indices of refraction appropriate to reflect more than 99% of incident light at one or more predetermined wavelengths of light in the range of about 300 to about 1,200 nanometers and to transmit a substantial amount of all other incident light in the range. These articles are made by an electron beam evaporation technique under vacuum and under controlled conditions of temperature, partial pressure of oxygen, and deposition rates.