The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 1988

Filed:

Oct. 07, 1986
Applicant:
Inventors:

Dietmar Seyferth, Lexington, MA (US);

Joanne M Schwark, Cambridge, MA (US);

Yuan-Fu Yu, Dayton, OH (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ; C07F / ;
U.S. Cl.
CPC ...
556410 ; 556411 ; 556412 ; 528 14 ; 528 21 ; 528 22 ; 528 28 ; 528 31 ; 528 32 ; 528 33 ; 528 34 ; 528 35 ; 528 38 ;
Abstract

A method of forming preceramic polymers using an organosilicon polymer containing Si--H repeat units by reacting it with alkali metal amide or silylamide is disclosed. Preferably, the silylamide is a polymeric silylamide formed by reacting in solution anhydrous ammonia with a mixture of R.sup.1 SiHX.sub.2 (where R.sup.1 is a lower alkyl group having from 1 to about 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 6 carbon atoms or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms; and X is a halogen) and R.sup.2 SiX.sub.3 (where R.sup.2 is H, a lower alkenyl group having from 1 to about 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 6 carbon atoms or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms). The Si--H containing organosilicon polymer is preferably selected from the group consisting of organopolysilanes of the formula [(RSiH).sub.x (RSi).sub.y ].sub.n (where R is a lower alkyl group having from 1 to about 6 carbon atoms, a lower alkenyl group having from 2 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, and n is greater than 1), a polycarbosilane having repeat units of the formula [R.sup.a Si(H)--(CH.sub.2).sub.q ] (where R.sup.a is H, a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, q is an integer 1 or greater), and a polysiloxane having repeat units of the formula [R.sup.b Si(H)O].sub.n (where R.sup.b is a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, and n is an integer greater than 1). Novel preceramic polymers formed by this method are also disclosed.


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