The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1988
Filed:
Apr. 03, 1985
Applicant:
Inventor:
Todd L Siler, Cambridge, MA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; D06P / ;
U.S. Cl.
CPC ...
264 78 ; 8484 ; 8486 ; 8497 ; 6820 / ; 118 44 ; 118 58 ; 118308 ; 118315 ; 118624 ; 264 24 ; 264108 ; 264131 ; 264132 ; 264136 ; 264293 ; 425-3 ; 425 90 ; 425385 ; 425464 ; 427198 ; 427272 ; 427276 ;
Abstract
A process and system for providing a design pattern in a material wherein a seleced medium is applied to the material, the material being positioned adjacent a surface of a template which surface has selected surface characteristics either topographical or non-topographical in nature. The material is held against the template surface at a selected pressure and for a selected time period, at least a portion of the medium coming into contact with the template surface. The surface characteristics of the template interact with the material and the medium as the medium comes into contact with the surface to produce the desired pattern.