The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1988
Filed:
Nov. 12, 1987
Tadahiro Kitahashi, Toyohashi, JP;
Osami Saito, Toyohashi, JP;
Tadaaki Matsuno, Shiga, JP;
Yoshihiro Nakamura, Kusatsu, JP;
Ishida Scales Mfg. Co., Ltd., Kyoto, JP;
Abstract
In a volume determination process, a slit pattern is projected obliquely downwardly, or slit patterns are projected obliquely downwardly and upwardly, onto an article which is at rest or in motion. The slit pattern or patterns are in the form of a parallel stripe pattern or a grid pattern. The surface or surface onto which the slit pattern or patterns are projected are imaged by a television camera, and the heights of slit positions on the article are computed on the basis of the image or images picked up by the television camera. The volume of the article is computed on the basis of the computed heights of the slit positions. The weight of the article can be derived by multiplying the volume by the specific gravity of the article. It is determined whether there is a surface flaw or not by determining whether differentials of the slit pattern or patterns are discrete or not.