The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 1988

Filed:

Jul. 10, 1987
Applicant:
Inventors:

Akira Maeda, Nagoya, JP;

Haruo Hagiwara, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06F / ; D06F / ;
U.S. Cl.
CPC ...
68 1 / ; 68 1 / ;
Abstract

A dry cleaning apparatus includes one processing tank, tanks capable of exclusively containing two or more types of solvents, respectively, capable of melting to be mixed with each other, a fractionating device for fractionating the two or more types of solvents and filters for respective solvents. A controller for the dry cleaning apparatus includes a central processor unit formed of an electronic circuit which is a center of control and washing programs for washing with a single solvent and combined solvents, the program being stored in the central processor unit. Accordingly, an optimum washing method can be selected in accordance with material, processing and form of clothes.


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