The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 1988
Filed:
Jul. 01, 1986
Applicant:
Inventor:
Siegfried Kalbitzer, Heidelberg, DE;
Assignee:
Max Planck-Gesellschaft zur Forderung der Wissenschaften e.V., Gottingen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; G03F / ;
U.S. Cl.
CPC ...
428446 ; 427 35 ; 427431 ; 427162 ; 427164 ; 428195 ; 428210 ; 428212 ; 428689 ; 428702 ; 430-5 ; 430275 ; 430296 ; 430308 ;
Abstract
A photomask useful as stencil or reticle comprises a thin layer, which includes regions of different optical transmissivity for light radiation of a predetermined spectral range. The layer consists of silicon or any other suitable semiconductor material, and the regions of different transmissivity consist essentially of the monocrystalline or amorphous phase of the mask material. The photomask may be manufactured by irradiating a thin layer of monocrystalline silicon with a focussed ion beam to convert the silicon within the irradiated regions into the amorphous phase.