The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1988
Filed:
Sep. 29, 1982
Herbert L Wilson, Woodbridge, VA (US);
William A Guiterrez, Woodbridge, VA (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
A process of high pressure close-space epitaxy in the semi-confined atmosre of a reusable demountable ampule in a furnace growth chamber. The ampule has a substrate and source materials placed therein whereupon the ampule is then loaded in the pressure furnace and the furnace is sealed air tight. Alternate steps of high pressure gas scrubbing and evacuating the interior of the furnace growth chamber including the interior of the ampule through small vents are first used to purify the growth environment. The source materials are then epitaxially grown on the substrate at a high pressure within the ampule. The ampule may be repeatedly used without having to be destroyed after each growth.