The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1988
Filed:
Oct. 23, 1987
Edward H Stupp, Spring Valley, NY (US);
North American Philips Corporation, New York, NY (US);
Abstract
A complementary Silicon-On-Insulator (SOI) Lateral Insulated Gate Rectifier (LIGR) is fabricated in a monocrystalline silicon layer provided on a major surface of a substantially insulating substrate. The monocrystalline silicon layer includes a number of adjacent, doped coplanar layer portions, with the complementary SOI LIGR device being formed of adjacent, contacting layer portions forming two complementary LIGR elements with a common source region. The common source region, as well as both of the drain regions of the device, are composed of regions of both the first and second conductivity types. In this manner, a simple, easily fabricated, balanced, high performance complementary LIGR structure is obtained in which undesired substrate currents are substantially eliminated.