The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 1988
Filed:
Apr. 08, 1986
Hiroshi Sunagawa, Kaisei, JP;
Jin Murayama, Kaisei, JP;
Nobuharu Nozaki, Kaisei, JP;
Yoji Okazaki, Kaisei, JP;
Kozi Kamiyama, Kaisei, JP;
Chiaki Goto, Kaisei, JP;
Toshio Iijima, Kaisei, JP;
Fuji Photo Film Co., Ltd., Minamiashigara, JP;
Abstract
A light beam scanning system comprises a stack of a wave guide layer and an adjacent layer normally exhibiting a refractive index smaller than that of the wave guide layer, the wave guide layer and/or the adjacent layer being made of a material whose refractive index changes by the application of energy. Many energy application devices are positioned at the wave guide layer and/or the adjacent layer along an optical path of wave guided inside of the wave guide layer. Dielectric gratings are positioned on the adjacent layer so as to correspond to sections where energy is applied. A drive circuit is provided for sequentially and selectively energizing the energy application devices, and changing the refractive index of the wave guide layer and/or the adjacent layer so that the guided wave is radiated out of the stack by interaction with the dielectric gratings at the sections where energy is applied.