The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 1988

Filed:

Apr. 08, 1986
Applicant:
Inventors:

Goran Hellblom, Taby, FR;

Claude Jacquot, Aix en Provence, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
31511181 ; 31511121 ; 31511101 ; 31323131 ; 2504 / ;
Abstract

An electron cyclotron resonance negative ion source comprises an enclosure containing a gas or vapor of a material for forming a plasma, means for injecting into the enclosure a high frequency electromagnetic field forming electrons by ionizing the gas or vapor, means for producing within the enclosure an axially symmetric magnetic field whose amplitude increases along the axis of symmetry, whereby said amplitude, which is at a maximum in the vicinity of and upstream of the negative ion extraction zone, having in the central region of the enclosure a value for which the electron cyclotron resonance condition is satisfied, as well as means for extracting the negative ions formed, brought to a positive potential compared with the enclosure.


Find Patent Forward Citations

Hellblom, Goran. (1988). Electron cyclotron resonance negative ion source (U.S. Patent No. 4757237). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4757237

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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