Image-forming materials sensitive to high-energy beam

Abstract

Disclosed is an image-forming material having a high sensitivity to high-energy beams and excellent in dry etching resistance, heat stability and resolution which comprises a copolymer containing a total of 1 to 99 mole-% of at least one of recurring structural units represented by the following formulas [A] and [A'] and 1 to 99 mole-% of at least one recurring structural unit represented by the following formula [B] and having a number-average molecular weight of 500 to 1,000,000: ##STR1## wherein R.sub.1 of the formulas [A] and [A'] represents a hydrogen or halogen atom, or an alkyl group having 1 to 6 carbon atoms, the substituent groups R.sub.1, epoxy group, and thiiranyl group being attached to the position ortho, meta, or para to the carbon atom in the main chain; X, Y, and Z of the formula [B] represent each a hydrogen atom, halogen atom, cyano group, alkyl group having 1 to 6 carbon atoms, halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms and bearing a substituent alkyl or halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms, --COOR.sub.2, --COR.sub.2, --O--COR.sub.2 (wherein R.sub.2 represents an alkyl or halogenated alkyl group having 1 to 12 carbon atoms, aryl group having 6 to 30 carbon atoms and bearing a substituent alkyl or halogenated alkyl group having 1 to 6 carbon atoms, or aryl group having 6 to 30 carbon atoms), nitro group, substituent group containing a hetero ring bearing substituent R.sub.3 (R.sub.3 represents a hydrogen atom, hydroxyl group, carboxyl group, halogen atom, nitro group, amino group, cyano group, alkyl or halogenated alkyl group having 1 to 6 carbon atoms, or aryl group having 6 to 30 carbon atoms), or substituent group containing a silicon atom. An image forming method using this material and an image-forming element are also disclosed.