The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1988
Filed:
Oct. 16, 1986
Yoshimi Kawanami, Kokubunji, JP;
Tohru Ishitani, Sayama, JP;
Kaoru Umemura, Kokubunji, JP;
Hifumi Tamura, Hachioji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In an ion micro beam apparatus which consists of an ion source, a beam focusing system which accelerates, focuses, mass-separates and deflects the ions emitted from said ion source, and a specimen plate for finely moving the specimen, the improvement comprising a mass separator which is constituted by: at least two stages of focusing lenses in said beam focusing system; four stages of E.times.B deflectors arranged between the two stages of lenses, each of said E.times.B deflectors being comprised of a pair of electrodes and a pair of magnetic pole pieces to generate an electric field and a magnetic field in the directions perpendicular to an ion optical axis, wherein among the four stages of E.times.B deflectors, the electric fields and magnetic fields generated by the E.times.B deflectors of the second and third stages as counted from the side of the ion source are set to be in parallel with, but opposite to, the electric field and magnetic field generated by the E.times.B deflector of the first stage, and the electric field and magnetic field of the E.times.B deflector of the fourth stage are set to be in parallel with, and in the same directions as, the electric field and magnetic field generated by the E.times.B deflector of the first stage; and a mass separating aperture which is located between the E.times.B deflector of the second stage and the E.times.B deflector of the third stage as counted from the side of the ion source, to mass-separate the ions.