The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 1988
Filed:
Jul. 25, 1986
Harvey N Rogers, Jr, Los Angeles, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A process for depositing an oxide layer on a substrate by exposing the substrate to a selected vapor phase reactant, a chosen oxygen-containing precursor, and a selected physical quenching gas, in the presence of radiation of a selected wavelength. The radiation causes the direct dissociation of the oxygen-containing precursor to form neutral oxygen atoms in an excited electronic state. The quenching gas physically interacts with the oxygen atoms in the excited electronic state to form oxygen atoms in the unexcited electronic state. The latter then react with the vapor phase reactant to form the oxide, which deposits as a layer on the substrate. The rate of reaction to form and deposit the oxide layer is enhanced by the conversion of the excited electronic state oxygen atoms to unexcited electronic state oxygen atoms by the physical quenching gas.