The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 1988
Filed:
Dec. 18, 1986
Applicant:
Inventors:
Edward D Parent, Hamilton, MA (US);
Charles S Purinton, Byfield, MA (US);
Charles W Sutter, Spanaway, WA (US);
Assignee:
GTE Products Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F / ;
U.S. Cl.
CPC ...
75228 ; 204292 ; 204293 ; 419 10 ; 419 33 ; 419 45 ; 419 48 ; 419 60 ; 501 96 ;
Abstract
A refractory metal silicide sputtering target is made by reacting refractory metal and silicon to about 70 to 90% completion of the reaction, comminuting the material, and then vacuum hot pressing the comminuted material to a high density compact.
Parent, Edward. (1988). Refractory metal silicide sputtering target (U.S. Patent No. 4750932). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4750932
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile