The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 1988
Filed:
Dec. 10, 1985
Applicant:
Inventors:
Assignee:
STC plc, London, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 39 ; 427 47 ; 427294 ;
Abstract
In a pulsed plasma process for surface treatment of a substrate the containing reactor vessel (11) has an inner cross-section conforming to the substrate geometry so as to confine the intense plasma region to the substrate surface (12). Preferably this region should be within 15 to 20 mm of the surface. Advantageously the inner surface is provided by a demountable insert (13).