The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 1988
Filed:
Jul. 21, 1986
Applicant:
Inventor:
Jan E van der Werf, Eindhoven, NL;
Assignee:
U.S. Philips Corp., New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ;
Abstract
An arrangement is described for aligning a mask (1) and a substrate (3) relative to each other by means of grating marks (M.sub.1, M.sub.2 ; P.sub.1, P.sub.2) in the mask and in the substrate. A diaphragm (32) is arranged in the path of the alignment beam (b') behind the mask grating (M.sub.2) and transmits only specific diffraction orders of the gratings (P.sub.2, M.sub.2), so that the alignment signal (S.sub.A) contains less undesired components and becomes more accurate.