The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 1988

Filed:

Oct. 20, 1986
Applicant:
Inventors:

Bernard Latorre, Vincennes, FR;

Guy N Martin, Noiseau, FR;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
118415 ; 118421 ;
Abstract

The invention relates to a crucible for the growth of epitaxial layers of chemical compounds formed from several chemical elements by means of epitaxial growth from the liquid phase comprising an elongated support (72), on which a movable part (73) slides longitudinally, the elongated support comprising at least one recess for accommodating a substrate (76) on which is to be deposited at least one epitaxial layer, the movable part comprising at least one cavity (77) receiving a mother source (79) formed from initial epitaxy materials, the cavity having on the surface adjoining the elongated support a lower opening whose dimensions correspond to the dimensions of the substrate (76) present therein. It is characterized in that the movable part (73) has throughout its length a longitudinal groove (81) on the surface which slides longitudinally on the elongated support, this groove having a depth slightly exceeding the irregularities of the substrate and sufficiently small in order that the mother source cannot pass by means of a capillary effect and a width smaller than the dimensions of the substrate in order that the latter cannot penetrate into it, and in that the recess of the elongated support accommodates an elevator (75) on which the substrate is placed, which holds the latter positioned on the lateral edges (82) of the groove (81), the elevator (75) being held in place by means of a small force developed by a pressure system, more particularly as asymmetrical lever (90) movable about an axis or a spring (85) of quartz.


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