The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 1988

Filed:

Dec. 15, 1986
Applicant:
Inventors:

Tadashi Fukuzawa, Tokyo, JP;

Akira Tonomura, Koganei, JP;

Naoki Chinone, Chofu, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; H01L / ;
U.S. Cl.
CPC ...
437 25 ; 437176 ; 437129 ; 437173 ; 437203 ; 437229 ; 437245 ; 437928 ; 430-1 ; 430329 ; 2504923 ; 148D / ; 148D / ; 148D / ;
Abstract

As a process for fabricating uniform patterns fine enough to produce a quantum size effect, the use of electron halography is proposed. Disclosed examples employing a process are methods of manufacturing a semiconductors laser whose threshold current is approximately 1 mA, and a permeable transistor and bistable device whose response rates are 100 GHz.


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