The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1988
Filed:
Oct. 31, 1986
Kit M Cham, Sunnyvale, CA (US);
Paul V Voorde, Mtn. View, CA (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
A MOSFET structure characterized by a lightly doped tip region located between the channel and drain, and a buried region located below the tip region and shifted laterally towards the drain. The buried region, which is doped to a level intermediate between that of the tip region and the drain, causes the channel current to deflect downwardly from the field oxide, through the lightly doped tip region, and into the buried region. The gradual electric field gradient produced by the structure and the deflection of the channel current away from the thin oxide greatly reduces the device's sensitivity to the hot electron effect. The method of the invention includes forming the lightly doped tip region, forming a first oxide spacer, forming the buried region, widening the oxide spacer, and finally forming the drain region.