The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1988
Filed:
Jan. 23, 1986
Hirofumi Yoshikawa, Hiroshima, JP;
Yuso Matsunaga, Hiroshima, JP;
Abstract
In a profiling method constructed so that NC working is performed on the basis of profile locus data obtained by profiling a shape of a model by a profiling machine, a digitized method of the profile locus is characterized in that position data of the model surface, obtained by adding a position of the profiling machine and a displacement signal from a tracer head at each sampling time, are rounded through a low-pass filter upon a profiling operation, and a time constant of the filter is automatically changed in response to the rate of change of the shape of the model. According to this method, fluctuation of the profiling machine, which can not be corrected by the filter heretofore and is an error as it is, is corrected, and a stylus displacement signal, delayed as compared with a response of a profiling machine position signal upon high speed profiling operation, is greatly improved so that high speed profiling operation can be attained.