The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 1988
Filed:
Aug. 25, 1986
Applicant:
Inventor:
Harald A Enge, Winchester, MA (US);
Assignee:
Eclipse Ion Technology, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ; 2504922 ;
Abstract
An ion source provides ions that pass through an analyzing magnet, image slit, and magnetic quadrupole lenses before entering a beam deflector. The deflected ion beam enters a magnetic field established by a dipole magnetic lens of rectangular cross section in planes parallel to the beam plane including the scanned ion beam, and having a variable width gap in a plane perpendicular to the beam plane that provides a parallel scanned ion beam. The parallel scanned ion beam enters a slot-shaped acceleration columnn and then scans a target.