The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 1988

Filed:

Nov. 21, 1986
Applicant:
Inventors:

Samir Y Farid, Rochester, NY (US);

Neil F Haley, Fairport, NY (US);

Roger E Moody, Rochester, NY (US);

Donald P Specht, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430281 ; 430286 ; 430914 ; 430920 ; 522 25 ;
Abstract

A negative working photoresist is disclosed responsive to imaging radiation of a wavelength longer than 550 nm comprised of an organic film forming component containing ethylenic unsaturation and capable of selective immobilization by addition at the site of ethylenic unsaturation and activator and photosensitizer coinitiators for ethylenic addition. The activator is an azinium salt activator, and the photosensitizer is a dye having its principal absorption peak at a wavelength longer than 550 nm and having a reduction potential which in relation to that of said azinium salt activator is at most 0.1 volt more positive.


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