The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1988
Filed:
Aug. 19, 1987
Applicant:
Inventor:
Hitoshi Hasegawa, Tama, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437183 ; 437203 ; 437245 ; 437246 ; 437189 ; 437190 ; 437192 ; 156664 ; 357 68 ; 357 67 ; 357 71 ;
Abstract
A method for producing a semiconductor device comprises the steps of: forming an insulating layer on a semiconductor substrate provided with an electrode portion thereon, forming a barrier metal layer over the entire surface thereof, forming a groove in the barrier metal layer so that the groove surrounds the electrode portion, burying a stopper material in the groove, forming a bump on the barrier metal layer positioned on the electrode portion, and removing the barrier metal layer outside of the stopper. The stopper prevents the removal of the inside barrier metal layer during the removal of the outside barrier metal layer.