The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 1988

Filed:

May. 28, 1986
Applicant:
Inventors:

Kenji Niwa, Chiba, JP;

Ichiro Ichikawa, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430331 ; 252156 ; 252528 ; 252529 ; 252541 ; 252547 ; 252548 ; 430149 ; 430154 ; 430309 ; 430325 ; 430326 ;
Abstract

A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.


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