The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 1988
Filed:
Jul. 17, 1986
Takao Osawa, Tokyo, JP;
Tetsumasa Ito, Tokyo, JP;
Seiko Instruments & Electronics Ltd., Tokyo, JP;
Abstract
An apparatus for mass-analyzing ions contained in plasma. A first vacuum chamber is maintained in a relatively low vacuum state and has a first aperture disposed adjacent to a plasma source for admitting therethrough the plasma into the first vacuum chamber. A second vacuum chamber is maintained in a relatively medium vacuum state and has a second aperture communicating between the first and second vacuum chambers. An ion extracting electrode is disposed in the second vacuum chamber for extracting ions contained in the plasma through the second aperture to form an ion stream composed of the extracted ions. A third vacuum chamber is maintained in a relatively high vacuum state and has a third aperture communicating between the second and third vacuum chambers. An ion focusing electrode is disposed in the third vacuum chamber for focusing the ion stream passing through the third aperture, and a mass spectrometer is disposed in the third vacuum chamber to receive the focused ion stream for analyzing the ions in the focused ion stream.