The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1988
Filed:
Jul. 14, 1986
Hideo Namatsu, Isehara, JP;
Akira Yoshikawa, Isehara, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Abstract
An intermediate layer material of a three-layer resist system for use in processing of a semiconductor substrate, comprising an organopolysiloxane. The organopolysiloxane is expressed by a general formula (R.sub.3 SiO.sub.1/2).sub.m.(R.sub.2 SiO).sub.n.(RSiO.sub.3/2).sub.p.(SiO.sub.2).sub.q {where R is independently a hydrocarbon group or an alkoxy group; and m, n, p and q represent composition ratios of respective units and satisfy m+n+p+q=1, 1.gtoreq.m>0, 1.gtoreq.n.gtoreq.0, 1.gtoreq.p.gtoreq.0, 1.gtoreq.q.gtoreq.0 (where p and q are not simultaneously 0), m/p.ltoreq.0.3 (where p.noteq.0), and/or m/q.ltoreq.1 (where q.noteq.0)}.