The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1988
Filed:
Jul. 10, 1986
Applicant:
Inventors:
Assignee:
U.S. Philips Corp., New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350432 ;
Abstract
For manufacturing monaspherical lenses, a correction layer of a synthetic resin is provided on a substrate having a spherical surface. In this method, centering is performed by using the curvature of the surface of the matrix. With a correct choice of the radius of curvature of the substrate surface, the substrate approaches the matrix most closely near a collection of inflection points in the matrix surface situated on a circle. A good centering without a guiding mechanism is possible by using the method according to the invention. Moreover, the differences in thickness in the correction layer are small enough to prevent shrinkage defects upon curing of the synthetic resin layer.