The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 1988
Filed:
Jul. 14, 1986
Applicant:
Inventor:
David W Weyburne, Maynard, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118725 ; 118715 ; 118728 ; 118730 ;
Abstract
A metal organic chemical vapor deposition reactor 10 which includes a flat plate flow channel gas delivery system 18. The gas delivery system comprises slotted rods 40, 42 which pass through an assembly 46 of seal plates 52 and gas directing plates 50. Gas directing plates 52 provide separate flow channels for reactant gases in rods 40 and 42. Reactants are directly jetted from the gas directing plates onto a substrate 20 prior to mixing.