IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 4736055 B1

PDFFull Text
Date of Patent:
Apr. 05, 1988

Filed:

Apr. 11, 1986

Oxime sulfonates containing reactive groups

Applicant:
Inventors:

Kurt Dietliker, Fribourg, CH;

Werner Rutsch, Fribourg, CH;

Godwin Berner, Binningen, CH;

Max Hunziker, Bosingen, CH;

Christopher G Demmer, Cambridge, GB;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:

Hall; Luther A. R.

Primary Examiner:

Michael L Shippen

Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
560 13 ; 544146 ; 544152 ; 544159 ; 546206 ; 546212 ; 546213 ; 546214 ; 546226 ; 548517 ; 548527 ; 548546 ; 549 60 ; 549 72 ; 549 75 ; 549 76 ; 549488 ; 549491 ; 549496 ; 549551 ; 549552 ; 558-7 ; 558 48 ; 558 49 ; 558 51 ; 558 52 ; 558 55 ; 558 56 ; 558 57 ; 558 58 ; 560 10 ; 560 12 ; 560118 ; 560125 ; 560139 ; 560145 ; 560149 ; 560151 ; 560220 ; 560221 ; 560222 ; 560355 ; 560358 ; 560330 ; 562427 ; 562428 ; 562430 ; 562500 ; 562507 ; 562556 ; 564154 ; 564162 ; 564191 ; 564192 ; 564194 ; 564197 ; 564198 ; 564204 ; 564207 ; 564208 ; 564254 ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 526256 ; 526260 ; 526263 ; 526270 ; 526280 ; 526287 ; 20415916 ; 427 541 ;
Abstract

Oxime sulfonates of formula I ##STR1## wherein Y is a polymerizable unsaturated group or epoxide group or an --OH, --NHR.sup.5, --COOH, COOR.sup.6, --COCl, --CH.sub.2 Hal, --SO.sub.2 Cl or --NCO group, Z is an (x+y)-valent connecting member, R.sup.1 and R.sup.2 are monovalent organic radicals, m is 0 or 1, x is 1 or 2 and y is 1 or 2, can be converted into polymers which can be thermally or photochemically dissociated to form free sulfonic acid groups. Said polymers can therefore be used as photoresists which can be developed with aqueous alkalis.

Find Patent Forward Citations

Loading…