The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1988
Filed:
Aug. 28, 1986
Alan B Hamersley, Orange, CA (US);
Michael W Goff, La Mirada, CA (US);
Vinai K Thummalapally, Anaheim, CA (US);
Thomas M Whitworth, Huntington Beach, CA (US);
Ramchandra R Nomula, Irvine, CA (US);
Quixote Corporation, Chicago, IL (US);
Abstract
An information recording medium includes a substrate having first and second sides. A layer of photoresist is deposited on the first side of the substrate. This layer of photoresist has a selected thickness and defines an area of openings therein such that the first side of the substrate is exposed at the openings, the openings being distributed in a pattern indicative of selected stored information. A reflecting layer is deposited on the photoresist layer and on the first side of the substrate at the openings. Both the substrate and the layer of photoresist are adapted to transmit the reading beam such that a portion of the reading beam incident on the second side of the substrate is reflected out of the substrate by the reflecting layer, both in a first region comprising the openings and in a second region between the openings. The selected thickness of the photoresist is chosen to provide destructive interference between the portions of the reading beam reflected out of the substrate by the reflecting layer in the first and second regions. Methods for forming such a recording medium by photolithographic techniques are disclosed.