The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1988
Filed:
Apr. 03, 1987
Masaaki Nomura, Odawara, JP;
Takashi Yamada, Odawara, JP;
Ryoichi Yamamoto, Odawara, JP;
Akira Nahara, Odawara, JP;
Fuji Photo Film Co., Ltd., , JP;
Abstract
A method of making a magneto-optical recording medium comprises the steps of moving a rotating substrate along a first dielectric target, at least one rare earth metal target, and a second dielectric target which are disposed in this order from an upstream side toward the downstream side in an in-line sputtering apparatus, and carrying out simultaneous sputtering on the substrate in the course of the movement of the substrate by use of the first dielectric target and the rare earth metal target. Thereafter, sputtering is carried out on the substrate by use of the rare earth metal target. Then, simultaneous sputtering is carried out on the substrate by use of the rare earth metal target and the second dielectric target.