The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1988
Filed:
Jun. 23, 1987
Kin-Chung R Chiu, Scotts Valley, CA (US);
Other;
Abstract
Vapor phase waste species are removed from effluent gas streams using a plasma extraction reactor comprising a pair of parallel, spaced-apart electrodes. The electrodes are driven under conditions, usually at radio frequency, to induce a glow discharge in the waste species, and the excited species are deposited directly on the electrode surface. By providing a very high ratio of electrode area to reactor volume and waste gas volumetric flow rate, substantially complete removal of the waste species can be effected. The system is particularly useful in removing contaminant species discharged from semiconductor processing operations, such as chemical vapor deposition and plasma etching. The method and system are particularly advantageous in that the vapor phase waste products are converted to a solid phase deposited directly on the electrodes which may then be disposed of.