The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1988
Filed:
Mar. 14, 1986
Kazutoshi Ohta, Yokohama, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method and an apparatus for projecting and exposing a photomask pattern of a master mask onto a plurality of re-exposing substrates using first and second pluralities of positioning markers, marked on the master mask and a standard marker substrate, respectively, and a condensing optical system for optically aligning the mounting positions of the master mask and the re-exposing substrate and exposing the photomask pattern onto the re-exposing substrate, where the master mask and the re-exposing substrate are placed at the conjugate points of the condensing optical system. In an embodiment in which the focus length of the condensing optical system is long, the standard marker substrate is fixed in close proximity to the re-exposing substrate on the optical axis of the condensing optical system to produce a shadow image of the second positioning markers on the re-exposing substrate. In a second embodiment, in which the focus length of the condensing optical system may be long or short, the condensing optical system is separated into two condensing optical parts which are optically connected in series at a optically relaying node, and the standard marker substrate is positioned at the optically relaying node.