The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1988
Filed:
Aug. 21, 1986
William J Lloyd, Belmont, CA (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
A unique inverse processed film resistance heater structure including a conventional passivation wear layer which is deposited directly on a first substrate. This deposition step is then followed by the deposition and patterning of resistance and conductive layers, and these layers are covered by an isolation layer and a thick support layer. The thick support layer is then bonded to a second substrate and the first substrate is removed so that a uniform, flat passivation layer is exposed. The result is a film resistor which has a reduced failure rate as compared to the prior art because it is covered by a planar passivation wear layer with fewer pin-holes and reduced stress.