The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1988
Filed:
Jan. 24, 1986
Theodore S Fahlen, San Jose, CA (US);
Sheldon B Hutchison, Santa Clara, CA (US);
Timothy McNulty, San Jose, CA (US);
XMR, Inc., Santa Clara, CA (US);
Abstract
An improved optical beam integration system for homogenizing a nonuniform radiant energy beam having a nonuniform beam intensity profile characteristic. The optical beam integration system comprises a first crossed lenticular cylindrical lens structure, a second crossed lenticular cylindrical lens structure, and a focusing lens interposed between a radiant energy source and an image or work plane. The nonuniform radiant energy beam from the radiant energy source refracts sequentially through the first and second crossed lenticular cylindrical lens structures and the focusing lens so as to produce a homogenized beam which forms an image in the work plane. The work plane is at a constant distance from the optical beam integration system. Preferably, the optical beam integration system is adjustable for selectively setting the size of the image produced by the homogenized beam in the work plane. The optical beam integration system is also preferably adjustable so that the aspect ratio of the image produced by the homogenized beam in the work plane can be selectively set. As a result, the effectiveness and flexibility of semiconductor processing by means of an ultraviolet excimer laser, for example, are substantially improved.