The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1988
Filed:
Sep. 09, 1985
Frederick J Robinson, Crawley, GB;
Michael T Wauk, II, Haywards Heath, GB;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A dual mechanical movement scanning system for ion implantation includes a radial scan arm which is mounted at a fixed pivot point external to the system vacuum chamber and penetrates the chamber and supports the wafer paddle or wheel within the chamber. The fast-scan component is provided by rotation of the paddle on the support arm; the slow-scan component is provided by pivotal movement of the scan arm itself. The drive system which reciprocally pivots the radial scan arm is configured geometrically so that controlled movement of one arm of the drive system is translated as l/r velocity of the rotational axis relative to the beam path. The wafer paddle can be constructed to provide a variable implant angle and to use a component of centrifugal force to hold the wafers in place without clamps or other mechanical means.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile