The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1988
Filed:
Sep. 20, 1985
Applicant:
Inventors:
Rajan Bawa, Fairport, NY (US);
William G Deichert, Macedon, NY (US);
Assignee:
Bausch & Lomb Incorporated, Rochester, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B29D / ;
U.S. Cl.
CPC ...
264-14 ; 264-21 ; 264 22 ; 264311 ; 425808 ;
Abstract
While polymerizing a contact lens monomer in a mold, grooves or other surface configurations are formed on the resulting polymeric lens surface by irradiating the monomer through a mask pattern which corresponds to the grooves or other desired configurations.