The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1988
Filed:
Apr. 16, 1986
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
An optical surface profile measuring device adapted to be able to simultaneously or substantially simultaneously measure a same part on the surface of an object to be measured with two different measuring ranges by combining a surface profile measuring device of a high resolving power using the critical angle method with a surface profile measuring device having a wide measuring range using the astigmatism method, in order to facilitate the setting of a detecting head within a measuring range while maintaining a high resolving power and to enable to measure automatically regardless of the state of the measured surface. This optical surface profile measuring device is provided with an iris stop or liquid crystal shutter capable of varying the numerical aperture behind an objective lens to allow the free setting of the resolving power or the measuring range, and further provided with an aperture stop to make the numerical aperture on the detecting side smaller than the numerical aperture on the projecting side to thereby obtain the proper measuring result even if the measured surface inclines with respect to the optical axis.