The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1988
Filed:
Mar. 13, 1986
Richard F Cheney, Norwalk, CT (US);
Other;
Abstract
Atomizing techniques produce fine and uniform ceramic powders and metal powders, by melting the particulate metal or ceramic to be atomized at high temperatures in a plasma melting torch, impacting the stream of high temperature gas and drops of molten feed material against a suitable moving impact substrate to produce fine droplets, and chilling these droplets in a quench gas to produce rapid solidification, optimizing internal crystal structure. The substrate is formed as a disk or belt moved continuously to produce constantly changing impact zones, and a liquid rinsing and squeegee wiping operation or a vacuum cleaning operation is employed to clear the substrate of any accumulated residue of the impacted material. The rapidly solidified particles are recovered by filtration or separating steps from the quench gas and the rinsing liquid. A preferred impact substrate material is a thin layer or Teflon FEP laminated to a slightly thicker layer of aluminum foil.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile