The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1988
Filed:
Apr. 15, 1987
Applicant:
Inventors:
Louis S Napoli, Hamilton Township, Mercer County, NJ (US);
John P Russell, Pennington, NJ (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; B29C / ;
U.S. Cl.
CPC ...
156643 ; 156645 ; 156646 ; 156652 ; 156655 ; 156657 ; 1566591 ; 156662 ; 156668 ;
Abstract
A process is provided for forming a patterned layer of a polymeric material on a substrate for the lithographic processing thereof. A layer of polymeric material is formed on the substrate, embossed to form a pattern of peaks and valleys and dry etched to remove the residual polymeric material in the valleys, thereby exposing a portion of the substrate surface.
Napoli, Louis. (1988). Process for forming a lithographic mask (U.S. Patent No. 4731155). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4731155
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile