The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1988
Filed:
Apr. 09, 1986
Taro Ototake, Kanagawa, JP;
Tatsumi Ishizeki, Saitama, JP;
Nippon Kogaku K.K., Tokyo, JP;
Abstract
A method and apparatus for the precision measurement of positions, dimensions, etc., of a pattern or mark formed on the surface of a flat object such as a photographic mask or reticle. The amount of vertical deviation of the object with respect to a reference plane is detected at each of a plurality of measuring points and the incline of the surface of the object with respect to the reference plane at each of the measuring points is determined in accordance with the amounts of deviation and the distance between the measuring points. The coordinate positions of each of the measuring points in the reference plane are measured in accordance with the amount of movement of the object parallel to the reference plane and the coordinate positions are corrected in accordance with the corresponding incline.