The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 1988
Filed:
Jul. 15, 1986
Applicant:
Inventors:
Paul R Caron, Tiverton, RI (US);
Gilbert Fain, Freetown, MA (US);
Lee E Estes, Mattapoisett, MA (US);
Assignee:
PGL Corporation, Westport, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
33504 ; 33228 ; 3317 / ;
Abstract
A device (gage, data station, and software) and method to measure mean radius and deviations from mean radius of nominally cylindrical or conical shapes in a plane perpendicular to the nominal axis of revolution using curvature measurements at uniformly spaced intervals about the circumference is described. The system divides the contour of interest into equal segments and measures the local curvature at each point. The group of measurements combines with a closure constraint to produce a condition of mathematical overcompleteness. This is used to minimize the accumulation of measurement error.