The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1988
Filed:
Sep. 17, 1985
David J Coe, East Grinstead, GB;
U.S. Philips Corporation, New York, NY (US);
Abstract
A semiconductor device having the advantages of bipolar transistor characteristics (such as a low ON resistance) and of FET characteristics (such as a rapid turn-off) can be obtained by integrating and merging together in one semiconductor body a bipolar transistor T and two or more insulated-gate FETs T1 to T4. A lateral FET T1 is formed by providing a drain region adjacent to the base region of the bipolar T and an insulated gate overlying an intermediate channel area. A further FET T3 which is of complementary conductivity type to T1 may have a source region provided in the drain region and an insulated gate over a channel area between the source region and the emitter region of T. These insulated gates are connected together, for example as a common gate grid, so permitting T1 to be turned on to extract charge from the base region of the bipolar T during turn off when T3 is turned off to interrupt the terminal connection to the emitter region of bipolar T. A vertical insulated-gate field-effect transistor T4 having the same source region as T3 may be formed in parallel with the bipolar transistor T to share the main current path through the device. A very compact power device structure can be obtained with a two-dimensional array of alternating base regions and drain regions.