The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1988
Filed:
Dec. 04, 1985
Applicant:
Inventor:
Michael R Wertheimer, Westmount, Quebec, CA;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H05B / ;
U.S. Cl.
CPC ...
31511121 ; 315 39 ; 31511151 ; 118729 ; 118 501 ; 42218605 ;
Abstract
An apparatus for substantially uniformly treating a substrate with a microwave plasma consists of a mechanism for simultaneously moving the substrate in two directions relative to the direction of plasma production. In one embodiment, the substrate is simultaneously moved rotationally and translationally. In a second embodiment, the substrate is subjected to planetary motion.