The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 1988

Filed:

Jun. 27, 1986
Applicant:
Inventors:

Modest M Oprysko, Manopac, NY (US);

Peter L Young, Mercer Island, WA (US);

Mark W Beranek, Brown Deer, WI (US);

Assignee:

Gould Inc., Rolling Meadows, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 427 531 ; 427140 ;
Abstract

An apparatus for repairing both clear and opaque defects in a photomask having a metal film pattern on a glass plate in which a visible laser light source is pulsed at selected frequencies to direct an optically focused laser beam into a gas sealed cell containing a mask. At one frequency, the laser pulses ablate opaque mask defects. At another frequency, and with the cell filled with a metal bearing gas, the laser beam causes thermal decomposition of the gas and deposition of metal to cure clear defects.


Find Patent Forward Citations

Oprysko, Modest. (1988). Laser-based system for the total repair of photomasks (U.S. Patent No. 4727234). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4727234

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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