The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1988
Filed:
Nov. 20, 1986
Applicant:
Inventor:
Reimar Spohr, Darmstadt, DE;
Assignee:
Gesellschaft fur Schwerionenforschung mbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; B29C / ;
U.S. Cl.
CPC ...
156626 ; 156627 ; 156628 ; 156643 ; 156644 ; 156654 ; 156668 ; 2504921 ;
Abstract
In a method for producing a substrate with microholes having a predetermined diameter, a test region on the substrate is irradiated with a significantly higher dosage of heavy ions than the rest of the substrate. During the development of the nuclear traces by etching, the surface of the substrate in the test region abruptly changes at a certain porosity. This macroscopically observable process is then utilized to interrupt the etching process after a precisely defined time, which is calibrated to provide microholes having a predetermined diameter on the remainder of the substrate.