The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1988
Filed:
Sep. 29, 1986
Roger L Mortensen, Victoria, MN (US);
Empak, Inc., Chanhassen, MN (US);
Abstract
Wafer processing cassette for the processing of silicon wafers, which includes a plurality of open, reinforced, dual cross-section profiled wafer dividers for structural integrity and for supporting a plurality of wafers in alignment in opposing mirror image dividers of the cassette for automated robotic processing of the wafers while in the cassette. The cassette utilizes a cross-bar end with a configured rod reinforced open cross-bar, which is fully functional and strategically located for structural integrity. The dividers are supported by two pairs of longitudinal horizontal supports secured to ends providing for a multi-level, flow-through, open area between each of the dual profile geometrically configured dividers for ease of entry and passage of liquids during automated processing. Rapid fluid flow and drying of the cassette is effected using extra smooth cassette surfaces, rounded edges, filled corners, drain recesses, drain scuppers, and ramped surfaces. The rear area includes a downward arch. The processing wafer cassette provides for on-center processing where the carrier center of gravity is on-center of the axis of centrifugal wafer processing machinery. Each of the dual profile dividers and wash slots cross-sections are geometrically configured for passage of chemicals during processing.