The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 1988

Filed:

Dec. 23, 1986
Applicant:
Inventor:

Howard J Davies, Kingston-upon-Thames, GB;

Assignee:

NPM International, London, GB;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 77 ;
Abstract

A method and apparatus are provided for photofabrication on a three-dimensional solid surface using a laser light beam (2) which is projected onto the surface which has previously been coated with photoresist. Mechanism (8, 9) is provided for moving the workpiece (3) so that all those parts of the photoresist layer are brought in turn into the exposure position. The photoresist is subsequently chemically developed to provide a patterned area of exposed underlying surface for further additive or subtractive physical or chemical processing. One of many applications would be the production of non-planar printed circuit boards for electronic applications.


Find Patent Forward Citations

Davies, Howard. (1988). Photofabrication using laser light to expose photoresist (U.S. Patent No. 4724465). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4724465

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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