The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1988
Filed:
Jun. 30, 1987
Applicant:
Inventor:
Geoffrey Dearnaley, Abingdon, GB;
Assignee:
United Kingdom Atomic Energy Authority, London, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2504922 ;
Abstract
An apparatus 10 and a method are provided for treating silicon wafers 26 in vacuum with an ion beam B and for controlling the temperature of the wafers 26. The wafers 26 are mounted on a drum 22 which is rotated through the ion beam B, and which is large enough that the mean equilibrium temperature of the wafers 26, in the absence of any other energy sources, would be less than the desired temperature. The wafers 26 are additionally heated by infra-red lamps 34 so the desired temperature is achieved.