The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 1988

Filed:

Apr. 17, 1986
Applicant:
Inventor:

George J Krausse, Fort Collins, CO (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
315340 ; 315344 ; 313156 ; 313161 ;
Abstract

A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.


Find Patent Forward Citations

Krausse, George. (1988). Axial flow plasma shutter (U.S. Patent No. 4721891). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4721891

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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